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About CLPA

International Standards

The High-level Technology and Ease-of-Use

CC-Link has been certified to conform to international standards, IEC Standards and SEMI Standards for the semiconductor and FPD industries, in addition to Japanese Industrial Standards, Chinese National Standards, ISO Standards, Korean National Standards and Taiwanese Standards. An established de facto standard in Japan, now it is now also recognized as a global standard. It meets the conventional requirements for open networks, communication compatibility and a diverse lineup of compatible products. In addition, it can drastically improve the production efficiency of manufacturing systems and applications. Its high technological level and ease of use are internationally appreciated.

International Standard: ISO ISO15745-5: CC-Link approved in January 2007.
International Standard: IEC IEC61158: CC-Link approved in December 2007.
IEC61784: CC-Link approved in December 2007.
IEC61158: CC-Link IE Field approved in August 2014.
IEC61784: CC-Link IE Field approved in August 2014.
IEC61784-3-8: CC-Link IE Safety approved in August 2016.
SEMI Standard SEMI E54.12: CC-Link approved in 2001.
SEMI E54.23-0513: CC-Link IE Field approved in May 2013.
The National Standards of the People's Republic of China: GB GB/Z 19760-2005: CC-Link approved in December 2005.
GB/T 20229.4-6 Chinese BA (Building Automation) standard: CC-Link appeared in December 2006.
GB/T 19760-2008 Chinese highest standard for industrial networks: CC-Link approved in June 2009.
GB/Z 29496.1.2.3-2013: CC-Link Safety approved in June 2013.
GB/T 33537.1~.3-2017: CC-Link IE approved in April 2017.
Japanese Industrial Standards : JIS JIS TR B0031: CC-Link approved in May 2013.
Korean National Standard : KS KSB ISO 15745-5: CC-Link approved in March 2008.
KSC IEC 61158/61784: [CC-Link] Certified in December 2011.
KSC IEC 61784-5-8: [CC-Link/CC-Link IE] Certified in December 2014.
KS: CC-Link IE Safety to be approved in 2017.
Taiwan Standard : CNS CNS 15252X6068: CC-Link approved in May 2009.

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